A Study of the Effect of Back Grind Wheels on Wafer Edge Chippings and Die Strength
Journal of Engineering Research and Reports · pp. 8–14 · Published 11 Mar 2020
10.9734/jerr/2020/v11i117049Abstract
The drive for thinner package architecture is already becoming a necessity. There were a need of thinner Integrated Circuit or IC in order to fit in to thinner applications like mobile phones. One of the major semiconductor process that enables miniaturization was wafer back grinding. The process involves wafer thinning to a required thickness with the use of back grinding wheels that serve as the abrasive material. The paper will discuss the effect of back grind input parameters like step grinding and wheel grit size to its output characteristics like total thickness variation, edge chippings and die strength. Total thickness variation will define if the new wheel will not affect the variation with the wafer. On the other hand, edge chippings and die strength will define the reliability of the die on different conditions of the package. Lastly, these 3 characteristics will establish the manufacturability of the process as it will eliminate the probability of wafer breakage.
Cited by 1
Lan Zhang, Jun Wang, Huizhong Ma · JOM · 2025
Related research
- Wafer Thinning Process and Its Critical Manufacturability Requirements — shares topic coverage
- A Comprehensive Study for Specialized Silicon-on-Insulator Wafers — shares topic coverage
- Dicing before Grinding: A Robust Wafer Thinning and Dicing Technology — shares topic coverage
- Addressing Delamination through Advanced Semiconductor Die Design — shares topic coverage
Article metrics
Real usage data collected on this platform.
0
Page views
0
PDF downloads
0
Outbound clicks
1
Citations
Views by country
Approximate, from request IP at view time — not citizenship or institution. Countries with fewer than 5 views are grouped as "Other".
No views recorded yet.
Traffic sources
Referring site, by host.
No traffic recorded yet.
Views and downloads exclude known bots/crawlers. Citations combines this platform's own DOI-resolved index with each external source's own reported total — see Cited by above for individually listed citing works. Last refreshed 0 seconds ago.