Effect of Temperature on the Iron Sulphur Ratio of Pyrite Deposited by Aerosol Assisted Chemical Vapour Deposition Method
Christian Nweze, Masood Akhtar, Mohammad Azad Malik, Paul O’Brien, Stella Ezeonu
Physical Science International Journal · pp. 115–122 · Published 14 Nov 2014
10.9734/PSIJ/2015/12924Abstract
Pyrite semiconducting film was deposited on a glass substrate from the single source precursor (Fe (S2CN(Et)2)3) by Aerosol Assisted Chemical Vapour Deposition (AACVD). The p-XRD pattern of the deposited films shows that pure pyrite was deposited at 300°C whereas mixture of pyrite and marcasite was deposited at 350°C, 400°C and 450°C. EDX analysis shows that semiconducting pyrite was deposited at 300°C and 350°C, whereas metallic pyrite was deposited at 400°C and 450°C.
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