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Research Article Open access CC BY 4.0

Nitrogen Management through Nano Urea and Conventional Urea and its Effect on Wheat (Triticum aestivum L.) Growth and Yield

Divya Singh, Atish Yadav, Himanshu Tiwari, Anil Kumar Singh, Shivendra Singh, Rishi Kumar Yadav, Parthik Gangwar, Dhruvendra Singh Sachan

International Journal of Plant & Soil Science · pp. 1466–1473 · Published 3 Aug 2023

10.9734/ijpss/2023/v35i183414

Abstract

The field experiment was carried out at Agronomy Research Farm of Acharya Narendra Dev University of Agriculture and Technology, Kumarganj, Ayodhya (U.P.) during Rabi Season 2021-22 to study the “Study on performance of nitrogen management through nano urea and conventional urea in wheat (Triticum aestivum L.)” The experiment was laid out in Randomized Block Design with four replications and six treatments i.e. T1: Control, T2 : 100% recommended dose of nitrogen (RDN) through conventional Urea (40% at Basal+ 30% at 30days after sowing (DAS)+30% at 50DAS), T3 : 75% RDN through conventional Urea as Basal + 25% RDN through Nano Urea as Topdressing (at 30 and 50 DAS), T4 : 50% RDN through conventional Urea as Basal + 50% RDN through Nano Urea as Topdressing (at 30 and 50 DAS), T5 : 25% RDN through conventional Urea as Basal + 75% RDN through Nano Urea as Topdressing (at 30 and 50 DAS), T6 : 100% RDN through Nano Urea as Topdressing (50% at 30DAS+50% at 50DAS). The observation on different growth and yield parameters were recorded and analyzed statistically. The experimental results revealed that among the treatments, treatment T4 recorded highest plant height, number of tillers  m-2, leaf area index, dry matter accumulation, number of spikes m-2, length of spike, grains spike-1, yield and nutrient uptake. The highest net returns (₹ 51286 ha-1) and B:C ratio (1.42) were noticed by the application of T4 (50% RDN through conventional Urea as Basal + 50% RDN through Nano Urea as Topdressing (at 30 and 50 DAS). From this study, it can be concluded that T4 (50% RDN through conventional Urea as Basal + 50% RDN through Nano Urea as Topdressing (at 30 and 50 DAS) found most economical over other treatments, it gave more net returns.

Top dressing nano urea basal dose and wheat

Cited by 2

Contemporary formulations of urea for sustainable agriculture: a review

Nalini Singh, Khushbu Gumber, Archana Thakur · Journal of Plant Nutrition · 2025

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