Effect of Annealing and Thickness on Some Physical Characteristics of ZnO Films
Journal of Materials Science Research and Reviews · pp. 176–183 · Published 4 Mar 2019
10.9734/jmsrr/2019/v2i25Abstract
ZnO transparent conductive films were deposited on glass substrates at C by chemical Spray Pyrolysis Technique (CSPT). Also, the study investigated the impact of annealing of zinc oxide pieces with the rise in thickness. The structural and optical characteristics of the deposited films were studied by X-ray diffraction (XRD) and UV-VIS-NIR Spectrophotometer. The X-ray diffraction analysis detected that the polycrystalline films showed a distinctive orientation along (002) direction with a hexagonal wurtzite phase type. It is found that good crystallinity is acquired in the pieces annealed at C. All films showed an average transmittance of about 85%. The size of grain and lattice parameters of films was measured. The grain size increases as thickness increases. The values of the optical gap energy (Eg) are found to be in the range of 3.238 to 3.273 eV without annealing and in the range of 3.252 to 3.280 eV with annealing when the thickness varies from 355 to 445 nm.
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