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Research Article Open access CC BY 4.0

Detection of Organic Additives in Copper Plating Bath Using Voltammetric Methods That Involve a Screen-printed Nano-Au Electrode

Yu-Ching Weng, Jhih-Jie Huang, Chih-Yao Wang, Miao-Zhen Hong

Chemical Science International Journal · pp. 24–32 · Published 1 Sep 2021

10.9734/CSJI/2021/v30i730241

Abstract

Three electrochemical methods used to detect organic additives, A, B and C, in acidic plating baths. Cyclic voltammetric stripping (CVS) is used in industry to detect the concentration of organic additives indirectly by measuring the effect of commercial organic additives on the rate of copper deposition. This study directly determines the concentration of organic additives on a screen-printed nano-Au electrode at high potential using three different electrochemical methods: linear scanning voltammetry (LSV), differential pulse voltammetry (DPV) and square wave voltammetry (SWV). The results show that the response currents for the three electrochemical methods exhibit a linear relationship with the concentration of organic additives. The nano-Au electrode is the most sensitive device for the detection of organic additive B using LSV.

Copper electroplating additives sensor nano-Au electrode concentration detection

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